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Advances In Chemical Vapor Deposition Dimitra Vernardou

  • SKU: BELL-50655328
Advances In Chemical Vapor Deposition Dimitra Vernardou
$ 31.00 $ 45.00 (-31%)

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Advances In Chemical Vapor Deposition Dimitra Vernardou instant download after payment.

Publisher: MDPI
File Extension: PDF
File size: 33.19 MB
Pages: 94
Author: Dimitra Vernardou
ISBN: 9783039439249, 3039439243
Language: English
Year: 2021

Product desciption

Advances In Chemical Vapor Deposition Dimitra Vernardou by Dimitra Vernardou 9783039439249, 3039439243 instant download after payment.

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.

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