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Design For Manufacturability With Advanced Lithography 1st Edition Bei Yu

  • SKU: BELL-5235194
Design For Manufacturability With Advanced Lithography 1st Edition Bei Yu
$ 31.00 $ 45.00 (-31%)

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Design For Manufacturability With Advanced Lithography 1st Edition Bei Yu instant download after payment.

Publisher: Springer International Publishing
File Extension: PDF
File size: 5.32 MB
Pages: 173
Author: Bei Yu, David Z. Pan (auth.)
ISBN: 9783319203843, 3319203843
Language: English
Year: 2016
Edition: 1

Product desciption

Design For Manufacturability With Advanced Lithography 1st Edition Bei Yu by Bei Yu, David Z. Pan (auth.) 9783319203843, 3319203843 instant download after payment.

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

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