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ISBN 13: 9789513869991
Author: Kimmo Solehmainen
This thesis reports on the development of silicon-based microphotonic waveguide components, which are targeted in future optical telecommunication networks. The aim of the work was to develop the fabrication of silicon microphotonics using standard clean room processes which enable high volume production. The waveguide processing was done using photolithography and etching. The default waveguide structure was the rib-type, with the waveguide thickness varying from 2 to 10 µm. Most of the work was done with silicon-on-insulator (SOI) wafers, in which the waveguide core was formed of silicon. However, the erbium-doped waveguides were realised using aluminium oxide grown with atomic layer deposition. In the multi-step processing, the basic SOI rib waveguide structure was provided with additional trenches and steps, which offers more flexibility to the realisation of photonic integrated circuits.
photonic waveguides
fabrication engineering at the micro- and nanoscale 4th edition pdf
h waveguide
k fabrication
fabrication of photonic crystals
fabrication of nanophotonic devices
