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Ion Impantation Technology 16th International Conference on Ion Implantation Technology IIT 2006 2006th Edition by Karen J Kirkby, Russell Gwilliam, Andy Smith, David Chivers ISBN 0735403651 978-0735403659

  • SKU: BELL-2096560
Ion Impantation Technology 16th International Conference on Ion Implantation Technology IIT 2006 2006th Edition by Karen J Kirkby, Russell Gwilliam, Andy Smith, David Chivers ISBN 0735403651 978-0735403659
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Ion Impantation Technology 16th International Conference on Ion Implantation Technology IIT 2006 2006th Edition by Karen J Kirkby, Russell Gwilliam, Andy Smith, David Chivers ISBN 0735403651 978-0735403659 instant download after payment.

Publisher: American Inst. of Physics
File Extension: PDF
File size: 31.56 MB
Pages: 645
Author: Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers
ISBN: 9780735403659, 0735403651
Language: English
Year: 2006
Edition: 1

Product desciption

Ion Impantation Technology 16th International Conference on Ion Implantation Technology IIT 2006 2006th Edition by Karen J Kirkby, Russell Gwilliam, Andy Smith, David Chivers ISBN 0735403651 978-0735403659 by Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers 9780735403659, 0735403651 instant download after payment.

Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006 2006th Edition by Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers - Ebook PDF Instant Download/Delivery: 0735403651, 978-0735403659

Full download Ion Impantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006 2006th Edition after payment

 

Product details:

ISBN 10: 0735403651

ISBN 13: 978-0735403659 

Author: Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers 

This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.

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Tags: Karen J Kirkby, Russell Gwilliam, Andy Smith, David Chivers, Ion, Implantation, Technology, 16th, International, Conference, IIT, 2006

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