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Lowk Nanoporous Interdielectrics Materials Thin Film Fabrications Structures And Properties Materials Thin Film Fabrications Structures And Properties 1st Edition Moonhor Ree Jinhwan Yoo Kyuyoung Heo

Name: Lowk Nanoporous Interdielectrics Materials Thin Film Fabrications Structures And Properties Materials Thin Film Fabrications Structures And Properties 1st Edition Moonhor Ree Jinhwan Yoo Kyuyoung Heo
SKU: BELL-51360748
Price: 31.00 USD
Availability: InStock
Rating: 4.1 (80 reviews)

SKU: BELL-51360748

Lowk Nanoporous Interdielectrics Materials Thin Film Fabrications Structures And Properties Materials Thin Film Fabrications Structures And Properties 1st Edition Moonhor Ree Jinhwan Yoo Kyuyoung Heo

$ 31.00 ~~$ 45.00~~ (-31%)

4.1

80 reviews

Lowk Nanoporous Interdielectrics Materials Thin Film Fabrications Structures And Properties Materials Thin Film Fabrications Structures And Properties 1st Edition Moonhor Ree Jinhwan Yoo Kyuyoung Heo instant download after payment.

Publisher: Nova Science Publishers, Incorporated

File Extension: PDF

File size: 2.1 MB

Pages: 77

Author: Moonhor Ree; Jinhwan Yoo; Kyuyoung Heo

ISBN: 9781617283185, 1617283185

Language: English

Year: 2010

Edition: 1

Product desciption

Lowk Nanoporous Interdielectrics Materials Thin Film Fabrications Structures And Properties Materials Thin Film Fabrications Structures And Properties 1st Edition Moonhor Ree Jinhwan Yoo Kyuyoung Heo by Moonhor Ree; Jinhwan Yoo; Kyuyoung Heo 9781617283185, 1617283185 instant download after payment.

The use of low dielectric constant (low-k) interdielectrics in multilevel structure integrated circuits (ICs) can lower line-to-line noise in interconnects and alleviate power dissipation issues by reducing the capacitance between the interconnect conductor lines. Because of these merits, low-k interdielectric materials are currently in high demand in the development of advanced ICs. One important approach to obtaining low-k values is the incorporation of nanopores into dielectrics. This book provides an overview of the methodologies and characterization techniques used for investigating low-k nanoporous interdielectrics.