Silver Metallization Stability And Reliability Daniel Adams Terry L Alford James W Mayer by Daniel Adams; Terry L Alford; James W Mayer 9781848000261, 9781848000278, 184800026X, 1848000278 instant download after payment.

Here is the first book to discuss the current understanding of silver metallization and its potential as a future interconnect material for integrated circuit technology. With the lowest resistivity of all metals, silver is an attractive interconnect material for higher current densities and faster switching speeds in integrated circuits. Over the past ten years, extensive research has been conducted to address the issues that have prevented silver from being used as an interconnect metal. The authors provide details on a wide range of experimental, characterization, and analysis techniques. The book is written for students, scientists, engineers, and technologists in the fields of integrated circuits and microelectronics research and development.