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Atomic Layer Deposition For Semiconductors 1st Edition Cheol Seong Hwang

  • SKU: BELL-4408594
Atomic Layer Deposition For Semiconductors 1st Edition Cheol Seong Hwang
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Atomic Layer Deposition For Semiconductors 1st Edition Cheol Seong Hwang instant download after payment.

Publisher: Springer US
File Extension: PDF
File size: 6.43 MB
Pages: 263
Author: Cheol Seong Hwang, Cha Young Yoo (auth.), Cheol Seong Hwang (eds.)
ISBN: 9781461480532, 9781461480549, 1461480531, 146148054X
Language: English
Year: 2014
Edition: 1

Product desciption

Atomic Layer Deposition For Semiconductors 1st Edition Cheol Seong Hwang by Cheol Seong Hwang, Cha Young Yoo (auth.), Cheol Seong Hwang (eds.) 9781461480532, 9781461480549, 1461480531, 146148054X instant download after payment.

This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such as DRAM and Flash, and emerging memories, such as PCRAM and FeRAM. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. The final section on ALD for machines looks at toolsets and systems hardware. Each chapter provides the history, operating principles, and a full explanation of ALD processes for each device.

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