Atomic Layer Deposition Principles Characteristics And Nanotechnology Applications Second Edition Tommi Kaariainen by Tommi Kaariainen, David Cameron, Marja?leena Kaariainen, Arthur Sherman(auth.) 9781118062777, 9781118747407, 1118062779, 1118747402 instant download after payment.

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.Content:
Chapter 1 Fundamentals of Atomic Layer Deposition (pages 1–31):
Chapter 2 Elemental Semiconductor Epitaxial Films (pages 33–49):
Chapter 3 III?V Semiconductor Films (pages 51–66):
Chapter 4 Oxide films (pages 67–159):
Chapter 5 Nitrides and Other Compounds (pages 161–182):
Chapter 6 Metals (pages 183–206):
Chapter 7 Organic and Hybrid Materials (pages 207–213):
Chapter 8 ALD Applications and Industry (pages 215–242):