Ferroelectric Dielectrics Integrated On Silicon Emmanuel Defa by Emmanuel Defaÿ 9781118602751, 9781848213135, 1118602757, 1848213131 instant download after payment.

This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterization. An in-depth study of the influence of leakage currents is performed together with reliability discussion. Three applicative chapters cover integrated capacitors, variables capacitors and ferroelectric memories. The final chapter deals with a reasonably new research field, multiferroic thin films.Content:
Chapter 1 The Thermodynamic Approach (pages 1–25):
Chapter 2 Stress Effect on Thin Films (pages 27–70):
Chapter 3 Deposition and Patterning Technologies (pages 71–110):
Chapter 4 Analysis Through X?Ray Diffraction of Polycrystalline Thin Films (pages 111–158):
Chapter 5 Physicochemical and Electrical Characterization (pages 159–182):
Chapter 6 Radio?Frequency Characterization (pages 183–212):
Chapter 7 Leakage Currents in PZT Capacitors (pages 213–279):
Chapter 8 Integrated Capacitors (pages 281–304):
Chapter 9 Reliability of PZT Capacitors (pages 305–340):
Chapter 10 Ferroelectric Tunable Capacitors (pages 341–378):
Chapter 11 Fram Ferroelectric Memories (pages 379–402):
Chapter 12 Integration of Multiferroic BiFeO3 Thin Films into Modern Microelectronics (pages 403–441):